WAFER CLEANING
The purpose of our standard cleaning process is to remove any polishing residues, organic materials, fingerprints, and most lost airborne particles from the surface of the wafers.
In our process, we immerse the wafers in a hot ultrasonic bath filled with optical cleaning detergent, rinse the wafers with hot DI water, blow-dry in a class 10000 environment, and immediately place it in the shipping container.
The customer needs to use its final cleaning procedures to prepare the wafers for processing.
Additional information on our quartz wafers: